Formation of ordered mesoscopic patterns in polymer cast films by dewetting

O. Karthaus, L. Gråsjö, N. Maruyama, M. Shimomura

    Research output: Contribution to journalArticle

    64 Citations (Scopus)

    Abstract

    Ordered arrays of polymer aggregates can be prepared by a simple process: rinsing of smooth hydrophilic surfaces with a dilute solution of a hydrophobic polymer. The patterns consist of submicron-size polymer aggregates which can form superlattices over several tens of micrometers, thus self-assembling several hundred aggregates in an orderly fashion. Atomic force microscopy shows that the structures consist of isolated 'polymer islands', separated by the bare substrate. The ordering of the aggregates can be explained by the formation of regular, dissipative structures caused by convection during the evaporation of the solvent, followed by dewetting of the hydrophobic polymer solution from the smooth hydrophilic surface.

    Original languageEnglish
    Pages (from-to)829-832
    Number of pages4
    JournalThin Solid Films
    Volume327-329
    Issue number1-2
    DOIs
    Publication statusPublished - 1998 Jan 1

    Keywords

    • Dewetting
    • Dissipative structure
    • Hydrophobie polymer
    • Mesoscopic pattern
    • Nanosize dot

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

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  • Cite this

    Karthaus, O., Gråsjö, L., Maruyama, N., & Shimomura, M. (1998). Formation of ordered mesoscopic patterns in polymer cast films by dewetting. Thin Solid Films, 327-329(1-2), 829-832. https://doi.org/10.1016/S0040-6090(98)00771-8