Formation of nanoparticles by control of electron temperature in hollow-typed magnetron radio frequency CH4/H2 plasma

Junichi Emi, Kohgi Kato, Toshimi Abe, Satoru Iizuka

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

In this study, we investigate the effects of electron temperature T e on the production of nanoparticles by using the grid-biasing method in hollow-typed magnetron radio frequency (RF) CH4/H2 plasma. We find that nanoparticles are produced in low-Te plasma. On the other hand, thin film depositions, such as nanowalls, are mainly observed and almost no nanoparticles are created in high-Te plasma. This implies that a reduction in the CH2/CH3 radical ratio is important for producing nanoparticles, together with a reduction in sheath potential in front of the substrate. The change in electron temperature in plasma has a marked effect on film quality.

Original languageEnglish
Pages (from-to)8071-8074
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number10 B
DOIs
Publication statusPublished - 2006 Oct 21

Keywords

  • CH/H plasma
  • Diamond
  • Graphite
  • Low-electron-temperature plasma
  • Nanoparticle

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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