Formation of Monomer Films on Copper Surfaces

Kunio Mori, Akira Watanabe, Aikou Muroi, Yoshiro Nakamura

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

6-Unsaturated group substituted-1,3,5-triazine-2,4-dithiol monosodium salts (RTDN) formed monomer films on copper surfaces when copper plates were immersed in RTDN solutions (10-5-10-2mol/l) at 50-90°C for 0-60min. The rate of formation of the monomer films was expressed by a paraboric law and influenced by immersion time, temperature, RTDN concentration, and the kind of solvents. The concentration of free RTDN molecules in solution appeared to be associated with the formation of monomer films judging from the fact that the rate became constant at a concentration above CMC. The rate was also influenced by the HLB value of RTDN and the properties of solvents. This suggests that the formation of monomer films on copper surfaces is accelerated by the repulsive force of solvent molecules against RTDN monomer molecules. The results of FT-IR and ESCA spectroscopies, the measurement of surface free energy and SEM photographs indicated that the monomer films consisted of mainly 6-unsaturated group-1,3,5-triazine-2-thione(3H)- 4-thiol and were multi molecular layers like a Y-type film by the LB technique. The mechanisms of the formation of monomer films and their growth were proposed on the basis of the above results.

Original languageEnglish
Pages (from-to)617-625
Number of pages9
JournalKOBUNSHI RONBUNSHU
Volume43
Issue number10
DOIs
Publication statusPublished - 1986
Externally publishedYes

Keywords

  • Conditions
  • Copper Surface
  • Formation Rate
  • Mechanisms
  • Monomer Thin Film
  • Surface Analysis

ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Materials Science (miscellaneous)
  • Environmental Science(all)
  • Polymers and Plastics

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