Formation of defect-fluorite structured NdNiO: XHy epitaxial thin films via a soft chemical route from NdNiO3 precursors

T. Onozuka, A. Chikamatsu, T. Katayama, T. Fukumura, T. Hasegawa

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A new phase of oxyhydride NdNiOxHy with a defect-fluorite structure was obtained by a soft chemical reaction of NdNiO3 epitaxial thin films on a substrate of SrTiO3 (100) with CaH2. The epitaxial relationship of this phase relative to SrTiO3 could be controlled by changing the reaction temperature. At 240 °C, NdNiOxHy grew with a [001] orientation, forming a thin layer of infinite-layer NdNiO2 at the interface between the NdNiOxHy and the substrate. Meanwhile, a high-temperature reaction at 400 °C formed [110]-oriented NdNiOxHy without NdNiO2.

Original languageEnglish
Pages (from-to)12114-12118
Number of pages5
JournalDalton Transactions
Issue number30
Publication statusPublished - 2016

ASJC Scopus subject areas

  • Inorganic Chemistry

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