Abstract
The phase of a TiO2 layer formed on commercially pure Ti by two-step thermal oxidation using N2-CO gas was investigated. The oxidation process comprised two steps: treatment in an N2-(0.1, 1 and 5)%CO atmosphere and treatment in air. ATi(C,N,O) phase was formed after the first-step treatment conducted at 873-1123 K. In the second step, the oxidation of this phase at 573-773 K resulted in the formation of an anatase phase, while its oxidation at 873K resulted in the formation of a single rutile phase. An increase in the CO partial pressure in the first step lowered the temperature for anatase phase formation. Further, in the second step, a single-phase anatase layer was formed at temperatures of 623 and 673 K.
Original language | English |
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Pages (from-to) | 1302-1307 |
Number of pages | 6 |
Journal | Materials Transactions |
Volume | 54 |
Issue number | 8 |
DOIs | |
Publication status | Published - 2013 |
Keywords
- Anatase
- Carbide
- Thermal oxidation
- Titania
- Two-step treatment
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering