Formation of Al-Cr-N coatings by dc reactive sputtering

Yukio Ide, Katsuhiko Kishitake, Takashi Nakamura

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

In this study, Al-Cr-N films were formed by a dc reactive sputtering process. The effect of the sputtering power and applied probe current on the emission density and ion current of reacting species in the plasma were determined by using optical emission spectroscope and a mass spectrometer. The formed films were characterized by X-ray diffraction, electron microscope analysis and auger electron spectroscopy.

Original languageEnglish
Pages (from-to)1576-1583
Number of pages8
JournalNippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Volume63
Issue number12
DOIs
Publication statusPublished - 1999 Jan 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys
  • Materials Chemistry

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