Formation of 0.3-nm-high stepped polymer surface by thermal nanoimprinting

Geng Tan, Naoya Inoue, Tomoyuki Funabasama, Masahiro Mita, Norimichi Okuda, Junichi Mori, Koji Koyama, Satoru Kaneko, Masaru Nakagawa, Akifumi Matsuda, Mamoru Yoshimoto

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We performed atomic-scale surface patterning with a vertical resolution of approximately 0.3nm on a poly(methyl methacrylate) (PMMA) polymer sheet (10 × 10mm2) by thermal nanoimprinting using an atomically stepped sapphire template (α-Al2O3 single crystal). The sapphire mold with (101̄2) r-plane exhibited regularly arranged straight steps with a uniform height of approximately 0.31 nm. The template nanopattern could be transferred onto the surface of the PMMA sheet under the imprinting conditions of 0.2 MPa load for 300 s at 140 °C. Atomic stairs with approximately 0.26-nm-high straight steps and approximately 600-nm-wide terraces were formed on the PMMA surface.

Original languageEnglish
Article number055202
JournalApplied Physics Express
Volume7
Issue number5
DOIs
Publication statusPublished - 2014 May

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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    Tan, G., Inoue, N., Funabasama, T., Mita, M., Okuda, N., Mori, J., Koyama, K., Kaneko, S., Nakagawa, M., Matsuda, A., & Yoshimoto, M. (2014). Formation of 0.3-nm-high stepped polymer surface by thermal nanoimprinting. Applied Physics Express, 7(5), [055202]. https://doi.org/10.7567/APEX.7.055202