Formation behavior and adhesion property of metallic Mn layer on porous SiOC by chemical vapor deposition

Yoshiyuki Tsuchiya, Daisuke Ando, Yuji Sutou, Junichi Koike

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

A metallic Mn layer was successfully formed on a porous SiOC (Black Diamond-III, BD-III) substrate at 300 °C by chemical vapor deposition (CVD) using a newly developed Mn precursor, bis[1-(tert-butylamide)-2- dimethylaminoethane-N,N']Mn. A thin layer of Mn silicate was also formed at the interface between the metallic Mn and the porous SiOC. The formation of the metallic Mn layer was a thermally activated process with the activation energy of 161.2 kJ&mol-1. The metallic Mn layer enhanced the adhesion and wettability of Cu on the BD-III substrates.

Original languageEnglish
Article number05GA10
JournalJapanese journal of applied physics
Volume53
Issue number5 SPEC. ISSUE 2
DOIs
Publication statusPublished - 2014 May

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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