Formation and decomposition of Si hydrides during adsorption of Si2H6 onto Si(100) (2 × 1)

Masanori Shinohara, Akio Seyama, Yasuo Kimura, Michio Niwano, Mineo Saito

Research output: Contribution to journalArticlepeer-review

38 Citations (Scopus)

Abstract

Infrared absorption spectroscopy in the multiple internal reflection geometry and hybrid density-functional cluster calculation are used to characterize the adsorption structure of hydride species that form during adsorption of disilane on Si(100)(2 × 1) at room temperature. We suggest that disilane dissociatively adsorbs without breaking its Si-Si bond to produce an adatom dimer, -H2Si-SiH2-, that bridges two adjacent dimers. We demonstrate that at low hydride coverage, a trihydride (-SiH3) formed by breaking the Si-Si bond of Si2H6, decomposes into dihydride and monohydrides, while at high hydride coverage, the trihydride decomposition is quenched. We also suggest that the impinging rate of adsorbing molecules has a significant effect on the adsorption kinetics.

Original languageEnglish
Article number075319
Pages (from-to)753191-753197
Number of pages7
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume65
Issue number7
Publication statusPublished - 2002 Feb 15

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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