Abstract
Infrared absorption spectroscopy in the multiple internal reflection geometry and hybrid density-functional cluster calculation are used to characterize the adsorption structure of hydride species that form during adsorption of disilane on Si(100)(2 × 1) at room temperature. We suggest that disilane dissociatively adsorbs without breaking its Si-Si bond to produce an adatom dimer, -H2Si-SiH2-, that bridges two adjacent dimers. We demonstrate that at low hydride coverage, a trihydride (-SiH3) formed by breaking the Si-Si bond of Si2H6, decomposes into dihydride and monohydrides, while at high hydride coverage, the trihydride decomposition is quenched. We also suggest that the impinging rate of adsorbing molecules has a significant effect on the adsorption kinetics.
Original language | English |
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Article number | 075319 |
Pages (from-to) | 753191-753197 |
Number of pages | 7 |
Journal | Physical Review B - Condensed Matter and Materials Physics |
Volume | 65 |
Issue number | 7 |
Publication status | Published - 2002 Feb 15 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics