FOREWORD: Plasma processing

Koichi Sasaki; Edward V. Barnat; Richard Engeln; Seiichiro Higashi; Tatsuo Ishijima; Masafumi Ito; Tsuyohito Ito; Keizo Kinoshita; Kazuaki Kurihara; Toshiki Nakano; Shota Nunomura; Yi Kang Pu; Osamu Sakai; Takehiko Sato

doi:10.7567/JJAP.54.01A001

FOREWORD: Plasma processing

Koichi Sasaki, Edward V. Barnat, Richard Engeln, Seiichiro Higashi, Tatsuo Ishijima, Masafumi Ito, Tsuyohito Ito, Keizo Kinoshita, Kazuaki Kurihara, Toshiki Nakano, Shota Nunomura, Yi Kang Pu, Osamu Sakai, Takehiko Sato

Nanoscale Flow Research Division

Research output: Contribution to journal › Editorial › peer-review

Original language	English
Article number	01A001
Journal	Japanese journal of applied physics
Volume	54
Issue number	1 Supplement
DOIs	https://doi.org/10.7567/JJAP.54.01A001
Publication status	Published - 2015 Jan 1

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.7567/JJAP.54.01A001

Cite this

@article{0f293fa4558243749bd2be3c29e2fd41,

title = "FOREWORD: Plasma processing",

author = "Koichi Sasaki and Barnat, {Edward V.} and Richard Engeln and Seiichiro Higashi and Tatsuo Ishijima and Masafumi Ito and Tsuyohito Ito and Keizo Kinoshita and Kazuaki Kurihara and Toshiki Nakano and Shota Nunomura and Pu, {Yi Kang} and Osamu Sakai and Takehiko Sato",

year = "2015",

month = jan,

day = "1",

doi = "10.7567/JJAP.54.01A001",

language = "English",

volume = "54",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "1 Supplement",

}

TY - JOUR

T1 - FOREWORD

T2 - Plasma processing

AU - Sasaki, Koichi

AU - Barnat, Edward V.

AU - Engeln, Richard

AU - Higashi, Seiichiro

AU - Ishijima, Tatsuo

AU - Ito, Masafumi

AU - Ito, Tsuyohito

AU - Kinoshita, Keizo

AU - Kurihara, Kazuaki

AU - Nakano, Toshiki

AU - Nunomura, Shota

AU - Pu, Yi Kang

AU - Sakai, Osamu

AU - Sato, Takehiko

PY - 2015/1/1

Y1 - 2015/1/1

UR - http://www.scopus.com/inward/record.url?scp=84920416579&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84920416579&partnerID=8YFLogxK

U2 - 10.7567/JJAP.54.01A001

DO - 10.7567/JJAP.54.01A001

M3 - Editorial

AN - SCOPUS:84920416579

VL - 54

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 1 Supplement

M1 - 01A001

ER -

FOREWORD: Plasma processing

ASJC Scopus subject areas

Access to Document

Other files and links

Cite this