FOREWORD: Plasma processing

Koichi Sasaki, Edward V. Barnat, Richard Engeln, Seiichiro Higashi, Tatsuo Ishijima, Masafumi Ito, Tsuyohito Ito, Keizo Kinoshita, Kazuaki Kurihara, Toshiki Nakano, Shota Nunomura, Yi Kang Pu, Osamu Sakai, Takehiko Sato

Research output: Contribution to journalEditorial

Original languageEnglish
Article number01A001
JournalJapanese journal of applied physics
Volume54
Issue number1 Supplement
DOIs
Publication statusPublished - 2015 Jan 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Sasaki, K., Barnat, E. V., Engeln, R., Higashi, S., Ishijima, T., Ito, M., Ito, T., Kinoshita, K., Kurihara, K., Nakano, T., Nunomura, S., Pu, Y. K., Sakai, O., & Sato, T. (2015). FOREWORD: Plasma processing. Japanese journal of applied physics, 54(1 Supplement), [01A001]. https://doi.org/10.7567/JJAP.54.01A001