Fmax enhancement of dynamic threshold-voltage MOSFET (DTMOS) under ultra-low supply voltage

Tetsu Tanaka, Youichi Momiyama, Toshihiro Sugii

Research output: Contribution to journalConference articlepeer-review

23 Citations (Scopus)

Abstract

The high frequency characteristics of DTMOS is described here for the first time. Our DTMOS has a small parasitic resistance due to an optimized Co salicide technology and a small parasitic capacitance due to a reduction in the overlapped region between the gate and drain, which is achieved by gate poly-Si oxidation before LDD implantation. We obtained an Ft of 78 GHz and an Fmax of 37 GHz for a 0.1-μm-Leff DTMOS even at a supply voltage of 0.7 V. We also noted an Fmax enhancement of 1.5 times compared to that of a conventional SOI MOSFET, which is attributed to a high transconductance and a large output resistance.

Original languageEnglish
Pages (from-to)423-426
Number of pages4
JournalTechnical Digest - International Electron Devices Meeting, IEDM
Publication statusPublished - 1997 Dec 1
Externally publishedYes
Event1997 International Electron Devices Meeting - Washington, DC, USA
Duration: 1997 Dec 71997 Dec 10

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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