TY - JOUR
T1 - Fluorescent UV-curable resists for UV nanoimprint lithography
AU - Kobayashi, Kei
AU - Sakai, Nobuji
AU - Matsui, Shinji
AU - Nakagawa, Masaru
PY - 2010/6/1
Y1 - 2010/6/1
N2 - We developed fluorescent UV-curable resists for UV nanoimprint lithography to readily detect residual layer thickness and analyze its profile in addition to pattern defects by fluorescence microscopy. A fluorescent dye of rhodamine 6G, 2-[6-(ethylamino)-3-(ethylimino)-2,7-dimethyl-3Hxanthen- 9-yl]benzoic acid ethyl ester tetrafluoroborate 5a, showed sufficient durability of photobleaching in solution toward UV-light exposure at <350nm in the absence and presence of a radical photoinitiator. The decrease of fluorescence intensity from the dye in a UV-cured thin film of a radical photopolymerization resin PAK-01 was suppressed at approximately 5% in comparison with the fluorescence intensity before UV-curing at an exposure dose of 1.0 J cm-2 monitored at 365 nm. It was confirmed that the fluorescence intensity of the UV-cured thin film showed a linear correlation to its thickness up to 100 nm. A dye-added PAK-01 resin was successfully available to UV nanoimprint. We demonstrated that the UV-cured thin film of the dye-containing resin was useful for facile confirmation and analysis of residual layer thickness in terms of its homogeneity.
AB - We developed fluorescent UV-curable resists for UV nanoimprint lithography to readily detect residual layer thickness and analyze its profile in addition to pattern defects by fluorescence microscopy. A fluorescent dye of rhodamine 6G, 2-[6-(ethylamino)-3-(ethylimino)-2,7-dimethyl-3Hxanthen- 9-yl]benzoic acid ethyl ester tetrafluoroborate 5a, showed sufficient durability of photobleaching in solution toward UV-light exposure at <350nm in the absence and presence of a radical photoinitiator. The decrease of fluorescence intensity from the dye in a UV-cured thin film of a radical photopolymerization resin PAK-01 was suppressed at approximately 5% in comparison with the fluorescence intensity before UV-curing at an exposure dose of 1.0 J cm-2 monitored at 365 nm. It was confirmed that the fluorescence intensity of the UV-cured thin film showed a linear correlation to its thickness up to 100 nm. A dye-added PAK-01 resin was successfully available to UV nanoimprint. We demonstrated that the UV-cured thin film of the dye-containing resin was useful for facile confirmation and analysis of residual layer thickness in terms of its homogeneity.
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U2 - 10.1143/JJAP.49.06GL07
DO - 10.1143/JJAP.49.06GL07
M3 - Article
AN - SCOPUS:77955337310
VL - 49
SP - 06GL071-06GL076
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 6 PART 2
ER -