Fluorescent resist materials for nanoimprint lithography

    Research output: Contribution to journalArticlepeer-review

    Abstract

    UV-curable resins and thermoplastic polymers doped with a fluorescent dye were useful for checking uniformity of residual layer thickness, detecting resist pattern defect, and monitoring resin adhesion to a mold surface in nanoimprinting. The facile and nondestructive inspection method by fluorescent microscopy is described.

    Original languageEnglish
    Pages (from-to)139-140
    Number of pages2
    JournalKobunshi
    Volume60
    Issue number3
    Publication statusPublished - 2011 Mar 1

    Keywords

    • Defect detection
    • Fluorescent microscopy
    • Fluorescent resist
    • Partem inspection
    • Residual layer thickness
    • Resin adhesion
    • Thermal nanoimprint lithography
    • UV nanoimprint lithography

    ASJC Scopus subject areas

    • Chemical Engineering(all)

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