Fluorescence imprint alignment using additive-type inclination moiré fringes

Takuma Yoshida, Shunya Ito, Kento Ochiai, Takahiro Nakamura, Masaru Nakagawa

Research output: Contribution to journalArticle

Abstract

It was studied whether additive-type fluorescence inclination moiré fringes were observed during imprint alignment by fluorescence microscopy using a pair of two periodical concave-line patterns with a long and short pitch of p 1 and p 2 prepared on silica mold and silicon substrate surfaces without any optically functional layer. A fluorescent liquid was sandwiched between the surfaces to fill into the concave lines and excited by exposure to visible light of 530-538 nm. In the detection wavelength range of 570-700 nm, additive-type fluorescence inclination moiré fringes generated from the place where bright concave lines with p 1 on the substrate were overlaid with bright concave lines with p 2 on the mold. The relationship of the mold-substrate angle deviation (θ) with the angle deviation (ψ) of an additive-type inclination moiré fringe was equal to the correlation of θ with the angle deviation (φ) of a multiplicative-type inclination moiré fringe.

Original languageEnglish
Article numberSIIJ04
JournalJapanese journal of applied physics
Volume59
Issue numberSI
DOIs
Publication statusPublished - 2020 Jun 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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