Fine particle removal by a negatively-charged fine particle collector in silane plasma

Yuji Kurimoto, Naoki Matsuda, Giichiro Uchida, Satoru Iizuka, Maki Suemitsu, Noriyoshi Sato

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

To suppress inclusion of fine particles in amorphous silicon films, a negatively-charged fine particle (NFP) collector has been successfully installed in a silane plasma. Two modes of operation of the NFP collector biasing were examined: (i) turning on after the appearance of fine particles; and (ii) turning on from the very beginning of the plasma operation. While the former proved the effectiveness of the NFP collector in the removal of fine particles, apparently very small particles (<100 nm) removal in the latter reduced the degradation of the photo conductivity in deposited a-Si:H films by light soaking. This effect is accompanied by the increased density of Si-H bonding, which can be related to the possible modification in the silicon networks in the amorphous film.

Original languageEnglish
Pages (from-to)285-291
Number of pages7
JournalThin Solid Films
Volume457
Issue number2
DOIs
Publication statusPublished - 2004 Jun 15

Keywords

  • Amorphous materials
  • Chemical vapor deposition
  • Plasma processing and deposition
  • Silicon

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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    Kurimoto, Y., Matsuda, N., Uchida, G., Iizuka, S., Suemitsu, M., & Sato, N. (2004). Fine particle removal by a negatively-charged fine particle collector in silane plasma. Thin Solid Films, 457(2), 285-291. https://doi.org/10.1016/j.tsf.2003.11.300