Field ion-scanning tunneling microscopy study of sulfur/chlorine adsorption on the cu(111) 1×1 surface

Kumi Motai, Tomihiro Hashizume, Dong Ryul Jeon, Hua Lu, Toshio Sakurai, Ken Ichi Tanaka, Howard W. Pickering

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Adsorption of sulfur and chlorine was studied on the Cu(111)1×1 surface using a field ion-scanning tunneling microscope. Atomically resolved high-quality STM images were obtained for the first time.

Original languageEnglish
Pages (from-to)L874-L876
JournalJapanese journal of applied physics
Volume31
Issue number7
DOIs
Publication statusPublished - 1992 Jul
Externally publishedYes

Keywords

  • Chemisorption
  • Chlorine
  • Cu
  • FI-STM
  • STM
  • Scanning tunneling microscopy
  • Sulfur

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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