Field ion-scanning tunneling microscopy study of sulfur/chlorine adsorption on the cu(111) 1×1 surface

Kumi Motai; Tomihiro Hashizume; Dong Ryul Jeon; Hua Lu; Toshio Sakurai; Ken Ichi Tanaka; Howard W. Pickering

doi:10.1143/JJAP.31.L874

Field ion-scanning tunneling microscopy study of sulfur/chlorine adsorption on the cu(111) 1×1 surface

Kumi Motai, Tomihiro Hashizume, Dong Ryul Jeon, Hua Lu, Toshio Sakurai, Ken Ichi Tanaka, Howard W. Pickering

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Adsorption of sulfur and chlorine was studied on the Cu(111)1×1 surface using a field ion-scanning tunneling microscope. Atomically resolved high-quality STM images were obtained for the first time.

Original language	English
Pages (from-to)	L874-L876
Journal	Japanese journal of applied physics
Volume	31
Issue number	7
DOIs	https://doi.org/10.1143/JJAP.31.L874
Publication status	Published - 1992 Jul

Keywords

Chemisorption
Chlorine
Cu
FI-STM
STM
Scanning tunneling microscopy
Sulfur

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/JJAP.31.L874

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Field ion-scanning tunneling microscopy study of sulfur/chlorine adsorption on the cu(111) 1×1 surface. / Motai, Kumi; Hashizume, Tomihiro; Jeon, Dong Ryul; Lu, Hua; Sakurai, Toshio; Tanaka, Ken Ichi; Pickering, Howard W.

In: Japanese journal of applied physics, Vol. 31, No. 7, 07.1992, p. L874-L876.

Research output: Contribution to journal › Article › peer-review

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AU - Tanaka, Ken Ichi

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