Field ion-scanning tunneling microscopy study of sulfur/chlorine adsorption on the cu(111) 1×1 surface

Kumi Motai, Tomihiro Hashizume, Dong Ryul Jeon, Hua Lu, Toshio Sakurai, Ken Ichi Tanaka, Howard W. Pickering

    Research output: Contribution to journalArticle

    7 Citations (Scopus)

    Abstract

    Adsorption of sulfur and chlorine was studied on the Cu(111)1×1 surface using a field ion-scanning tunneling microscope. Atomically resolved high-quality STM images were obtained for the first time.

    Original languageEnglish
    Pages (from-to)L874-L876
    JournalJapanese journal of applied physics
    Volume31
    Issue number7
    DOIs
    Publication statusPublished - 1992 Jul

    Keywords

    • Chemisorption
    • Chlorine
    • Cu
    • FI-STM
    • STM
    • Scanning tunneling microscopy
    • Sulfur

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

    Fingerprint Dive into the research topics of 'Field ion-scanning tunneling microscopy study of sulfur/chlorine adsorption on the cu(111) 1×1 surface'. Together they form a unique fingerprint.

  • Cite this

    Motai, K., Hashizume, T., Jeon, D. R., Lu, H., Sakurai, T., Tanaka, K. I., & Pickering, H. W. (1992). Field ion-scanning tunneling microscopy study of sulfur/chlorine adsorption on the cu(111) 1×1 surface. Japanese journal of applied physics, 31(7), L874-L876. https://doi.org/10.1143/JJAP.31.L874