FI-STM study of alkali metal adsorption on Si surfaces

T. Hashizume, Y. Hasegawa, I. Sumita, Toshio Sakurai

    Research output: Contribution to journalArticlepeer-review

    35 Citations (Scopus)

    Abstract

    Alkali metal (Cs/K) adsorption on the Si(111)7 × 7 and Si(100)2 × 1 surfaces was investigated with the FI-STM. At the initial coverage on the Si(111)7 × 7 surface, Cs(K) atoms adsorb at the on-top site of the center adatoms and are almost completely ionized. When heated at 300° C, a new 1 × 3 phase with misfit defects is formed. On the Si(100)2 × 1 surface, Cs atoms occupy the off-centered valley bridge site at the initial coverage. These results, together with Li/K adsorption, can be well understood based on the strong interaction between the directional Si dangling bonds and active alkali metal atoms.

    Original languageEnglish
    Pages (from-to)189-194
    Number of pages6
    JournalSurface Science
    Volume246
    Issue number1-3
    DOIs
    Publication statusPublished - 1991 Apr 3

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

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