FI-STM study of alkali metal adsorption on Si surfaces

T. Hashizume; Y. Hasegawa; I. Sumita; Toshio Sakurai

doi:10.1016/0039-6028(91)90413-M

FI-STM study of alkali metal adsorption on Si surfaces

T. Hashizume, Y. Hasegawa, I. Sumita, Toshio Sakurai

Research output: Contribution to journal › Article › peer-review

35 Citations (Scopus)

Abstract

Alkali metal (Cs/K) adsorption on the Si(111)7 × 7 and Si(100)2 × 1 surfaces was investigated with the FI-STM. At the initial coverage on the Si(111)7 × 7 surface, Cs(K) atoms adsorb at the on-top site of the center adatoms and are almost completely ionized. When heated at 300° C, a new 1 × 3 phase with misfit defects is formed. On the Si(100)2 × 1 surface, Cs atoms occupy the off-centered valley bridge site at the initial coverage. These results, together with Li/K adsorption, can be well understood based on the strong interaction between the directional Si dangling bonds and active alkali metal atoms.

Original language	English
Pages (from-to)	189-194
Number of pages	6
Journal	Surface Science
Volume	246
Issue number	1-3
DOIs	https://doi.org/10.1016/0039-6028(91)90413-M
Publication status	Published - 1991 Apr 3

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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abstract = "Alkali metal (Cs/K) adsorption on the Si(111)7 × 7 and Si(100)2 × 1 surfaces was investigated with the FI-STM. At the initial coverage on the Si(111)7 × 7 surface, Cs(K) atoms adsorb at the on-top site of the center adatoms and are almost completely ionized. When heated at 300° C, a new 1 × 3 phase with misfit defects is formed. On the Si(100)2 × 1 surface, Cs atoms occupy the off-centered valley bridge site at the initial coverage. These results, together with Li/K adsorption, can be well understood based on the strong interaction between the directional Si dangling bonds and active alkali metal atoms.",

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T1 - FI-STM study of alkali metal adsorption on Si surfaces

AU - Hashizume, T.

AU - Hasegawa, Y.

AU - Sumita, I.

AU - Sakurai, Toshio

PY - 1991/4/3

Y1 - 1991/4/3

N2 - Alkali metal (Cs/K) adsorption on the Si(111)7 × 7 and Si(100)2 × 1 surfaces was investigated with the FI-STM. At the initial coverage on the Si(111)7 × 7 surface, Cs(K) atoms adsorb at the on-top site of the center adatoms and are almost completely ionized. When heated at 300° C, a new 1 × 3 phase with misfit defects is formed. On the Si(100)2 × 1 surface, Cs atoms occupy the off-centered valley bridge site at the initial coverage. These results, together with Li/K adsorption, can be well understood based on the strong interaction between the directional Si dangling bonds and active alkali metal atoms.

AB - Alkali metal (Cs/K) adsorption on the Si(111)7 × 7 and Si(100)2 × 1 surfaces was investigated with the FI-STM. At the initial coverage on the Si(111)7 × 7 surface, Cs(K) atoms adsorb at the on-top site of the center adatoms and are almost completely ionized. When heated at 300° C, a new 1 × 3 phase with misfit defects is formed. On the Si(100)2 × 1 surface, Cs atoms occupy the off-centered valley bridge site at the initial coverage. These results, together with Li/K adsorption, can be well understood based on the strong interaction between the directional Si dangling bonds and active alkali metal atoms.

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FI-STM study of alkali metal adsorption on Si surfaces

Abstract

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