Femtosecond laser ablation dynamics of amorphous film of a substituted Cu-phthalocyanine

Yoichiroh Hosokawa; Masaki Yashiro; Tsuyoshi Asahi; Hiroshi Fukumura; Hiroshi Masuhara

doi:10.1016/S0169-4332(99)00484-5

Femtosecond laser ablation dynamics of amorphous film of a substituted Cu-phthalocyanine

Yoichiroh Hosokawa, Masaki Yashiro, Tsuyoshi Asahi, Hiroshi Fukumura, Hiroshi Masuhara

SCI - Chemistry

Research output: Contribution to journal › Conference article › peer-review

41 Citations (Scopus)

Abstract

Femtosecond laser ablation dynamics of an amorphous thin film of a substituted Cu-phthalocyanine was studied using time-resolved absorption spectroscopic and scattering imaging methods. Above the ablation threshold of 45 mJ/cm², the etch-depth is about 400 nm and almost constant up to a laser fluence of 300 mJ/cm². Transient absorption spectra confirmed that the electronic excitation energy is converted to heat through exciton-exciton annihilation within 100 ps after excitation. The etching profile and ablation threshold are discussed in connection with the heating rate.

Original language	English
Pages (from-to)	192-195
Number of pages	4
Journal	Applied Surface Science
Volume	154
DOIs	https://doi.org/10.1016/S0169-4332(99)00484-5
Publication status	Published - 2000 Feb 1
Event	The Symposium A on Photo-Excited Processes, Diagnostics and Applications of the 1999 E-MRS Spring Conference (ICPEPA-3) - Strasbourg, France Duration: 1999 Jun 1 → 1999 Jun 4

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

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title = "Femtosecond laser ablation dynamics of amorphous film of a substituted Cu-phthalocyanine",

abstract = "Femtosecond laser ablation dynamics of an amorphous thin film of a substituted Cu-phthalocyanine was studied using time-resolved absorption spectroscopic and scattering imaging methods. Above the ablation threshold of 45 mJ/cm2, the etch-depth is about 400 nm and almost constant up to a laser fluence of 300 mJ/cm2. Transient absorption spectra confirmed that the electronic excitation energy is converted to heat through exciton-exciton annihilation within 100 ps after excitation. The etching profile and ablation threshold are discussed in connection with the heating rate.",

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T1 - Femtosecond laser ablation dynamics of amorphous film of a substituted Cu-phthalocyanine

AU - Hosokawa, Yoichiroh

AU - Yashiro, Masaki

AU - Asahi, Tsuyoshi

AU - Fukumura, Hiroshi

AU - Masuhara, Hiroshi

PY - 2000/2/1

Y1 - 2000/2/1

N2 - Femtosecond laser ablation dynamics of an amorphous thin film of a substituted Cu-phthalocyanine was studied using time-resolved absorption spectroscopic and scattering imaging methods. Above the ablation threshold of 45 mJ/cm2, the etch-depth is about 400 nm and almost constant up to a laser fluence of 300 mJ/cm2. Transient absorption spectra confirmed that the electronic excitation energy is converted to heat through exciton-exciton annihilation within 100 ps after excitation. The etching profile and ablation threshold are discussed in connection with the heating rate.

AB - Femtosecond laser ablation dynamics of an amorphous thin film of a substituted Cu-phthalocyanine was studied using time-resolved absorption spectroscopic and scattering imaging methods. Above the ablation threshold of 45 mJ/cm2, the etch-depth is about 400 nm and almost constant up to a laser fluence of 300 mJ/cm2. Transient absorption spectra confirmed that the electronic excitation energy is converted to heat through exciton-exciton annihilation within 100 ps after excitation. The etching profile and ablation threshold are discussed in connection with the heating rate.

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SP - 192

EP - 195

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

T2 - The Symposium A on Photo-Excited Processes, Diagnostics and Applications of the 1999 E-MRS Spring Conference (ICPEPA-3)

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