Feasibility study of local structure analysis of ultrathin films by X-ray fluorescence holography

Yukio Takahashi, Kouichi Hayashi, Eiichiro Matsubara

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

The feasibility of the determination of local atomic structure was tested by computing Ge X-ray fluorescence hologram patterns of a Ge film 3 atomic layers thick on a Si substrate. An atomic image obtained from a single-energy hologram pattern exhibits many small oscillations and a precise atomic image is difficult to evaluate. By summing plural images reconstructed from holograms obtained at several different energies, the final atomic image is improved due to the disappearance of the oscillations. The full-width at half-maximum of peaks of the atomic image reconstructed from six holograms calculated at 27.0-29.5 keV with 0.5 keV steps is 0.03 nm. This clearly demonstrates that the XFH method has strong potential as an experimental tool for evaluating the local atomic structure.

Original languageEnglish
Pages (from-to)1475-1479
Number of pages5
JournalMaterials Transactions
Volume43
Issue number7
DOIs
Publication statusPublished - 2002 Jul
Externally publishedYes

Keywords

  • Local atomic structure
  • Thin film
  • X-ray fluorescence holography (XFH)

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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