FDTD analysis of wire antenna used for process plasma

Hiroyasu Sato; Katsuaki Tamashiro; Kunio Sawaya; Tomoko Takagi; Masashi Ueda; Yoshimi Watabe

doi:10.1109/APS.2001.960159

FDTD analysis of wire antenna used for process plasma

Hiroyasu Sato, Katsuaki Tamashiro, Kunio Sawaya, Tomoko Takagi, Masashi Ueda, Yoshimi Watabe

ENG - Communications Engineering

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Wire antenna used for plasma process was analyzed using finite difference time domain (FDTD) method. Considering the ion sheath around antenna conductor, the numerical results of the input impedance agreed with the experimental data. The return loss and field distribution were found to be improved by the presence of the ion sheath.

Original language	English
Pages (from-to)	561-564
Number of pages	4
Journal	IEEE Antennas and Propagation Society, AP-S International Symposium (Digest)
Volume	3
DOIs	https://doi.org/10.1109/APS.2001.960159
Publication status	Published - 2001

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1109/APS.2001.960159

Cite this

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title = "FDTD analysis of wire antenna used for process plasma",

abstract = "Wire antenna used for plasma process was analyzed using finite difference time domain (FDTD) method. Considering the ion sheath around antenna conductor, the numerical results of the input impedance agreed with the experimental data. The return loss and field distribution were found to be improved by the presence of the ion sheath.",

author = "Hiroyasu Sato and Katsuaki Tamashiro and Kunio Sawaya and Tomoko Takagi and Masashi Ueda and Yoshimi Watabe",

year = "2001",

doi = "10.1109/APS.2001.960159",

language = "English",

volume = "3",

pages = "561--564",

journal = "AP-S International Symposium (Digest) (IEEE Antennas and Propagation Society)",

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publisher = "Institute of Electrical and Electronics Engineers Inc.",

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T1 - FDTD analysis of wire antenna used for process plasma

AU - Sato, Hiroyasu

AU - Tamashiro, Katsuaki

AU - Sawaya, Kunio

AU - Takagi, Tomoko

AU - Ueda, Masashi

AU - Watabe, Yoshimi

PY - 2001

Y1 - 2001

N2 - Wire antenna used for plasma process was analyzed using finite difference time domain (FDTD) method. Considering the ion sheath around antenna conductor, the numerical results of the input impedance agreed with the experimental data. The return loss and field distribution were found to be improved by the presence of the ion sheath.

AB - Wire antenna used for plasma process was analyzed using finite difference time domain (FDTD) method. Considering the ion sheath around antenna conductor, the numerical results of the input impedance agreed with the experimental data. The return loss and field distribution were found to be improved by the presence of the ion sheath.

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DO - 10.1109/APS.2001.960159

M3 - Article

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VL - 3

SP - 561

EP - 564

JO - AP-S International Symposium (Digest) (IEEE Antennas and Propagation Society)

JF - AP-S International Symposium (Digest) (IEEE Antennas and Propagation Society)

SN - 0272-4693

ER -

FDTD analysis of wire antenna used for process plasma

Abstract

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