Fast growth of carbon nanowalls from pure methane using helicon plasma-enhanced chemical vapor deposition

Genta Sato, Tetsuharu Morio, Toshiaki Kato, Rikizo Hatakeyama

Research output: Contribution to journalArticlepeer-review

31 Citations (Scopus)

Abstract

Carbon nanowalls (CNWs) are synthesized under pure methane gas (CH 4) using helicon plasma-enhanced chemical vapor deposition. CH 4 in the helicon discharge is effectively dissociated to hydrogen atoms and hydrocarbon radicals, resulting in the formation of CNWs on a Ni substrate only from CH4. CNWs are grown up at a high growth rate of 18μm/h.

Original languageEnglish
Pages (from-to)5210-5212
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number6 A
DOIs
Publication statusPublished - 2006 Jun 28

Keywords

  • Carbon nanowalls
  • Chemical vapor deposition
  • Helicon discharge
  • High speed growth
  • Reactive plasma

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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