Fast Atom Beam Process Techniques

Hiroki Kuwano

doi:10.2493/jjspe.55.265

Fast Atom Beam Process Techniques

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	265-269
Number of pages	5
Journal	Journal of the Japan Society for Precision Engineering
Volume	55
Issue number	2
DOIs	https://doi.org/10.2493/jjspe.55.265
Publication status	Published - 1989 Jan 1
Externally published	Yes

Keywords

deposition
etching
fast atom beam
insulator
patterning
solid lubricant
thin film

ASJC Scopus subject areas

Mechanical Engineering

Access to Document

10.2493/jjspe.55.265

Cite this

@article{077d5830eb4e43c1a2e256443e50ff69,

title = "Fast Atom Beam Process Techniques",

keywords = "deposition, etching, fast atom beam, insulator, patterning, solid lubricant, thin film",

author = "Hiroki Kuwano",

year = "1989",

month = jan,

day = "1",

doi = "10.2493/jjspe.55.265",

language = "English",

volume = "55",

pages = "265--269",

journal = "Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering",

issn = "0912-0289",

publisher = "Japan Society for Precision Engineering",

number = "2",

}

TY - JOUR

T1 - Fast Atom Beam Process Techniques

AU - Kuwano, Hiroki

PY - 1989/1/1

Y1 - 1989/1/1

KW - deposition

KW - etching

KW - fast atom beam

KW - insulator

KW - patterning

KW - solid lubricant

KW - thin film

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DO - 10.2493/jjspe.55.265

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VL - 55

SP - 265

EP - 269

JO - Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

JF - Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

SN - 0912-0289

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