Fast atom beam-based fabrication of high-efficienct blazed grating using slanting angle control of a substrate

Cha Bum Lee, Kazuhiro Hane, Sun Kyu Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6 - 1.5 μm in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively.

Original languageEnglish
Title of host publication2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
Pages149-150
Number of pages2
DOIs
Publication statusPublished - 2010 Dec 1
Event2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010 - Sapporo, Japan
Duration: 2010 Aug 92010 Aug 12

Publication series

Name2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010

Other

Other2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
CountryJapan
CitySapporo
Period10/8/910/8/12

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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