Facile wide-scale defect detection of UV-nanoimprinted resist patterns by fluorescent microscopy

Kei Kobayashi, Shoichi Kubo, Shinji Matsui, Masaru Nakagawa

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    The occurrence of resist pattern defects in UV nanoimprinting with a spincoated resin thin film on a silicon wafer was studied by fluorescent microscopy using a fluorescent UV-curable liquid resin causing radical photopolymerization. The generation of nonfill defects with a surface-modified silica mold with submicrometer line cavities was compared between UV nanoimprinting atmospheres of air and pentafluoropropane. It was visualized in a rapid and nondestructive manner that nonfill defects were hardly induced by UV nanoimprinting under easily condensable pentafluoropropane atmosphere, while nonfill defects owing to bubble trap and resin adhesion to a mold surface were observed in the case of UV nanoimprinting under air atmosphere. The fluorescent microscopy using the fluorescent UV-curable resin was useful for mold inspection whether or not the submicrometer-scale mold cavities were partially filled with the resin. To investigate a resolution limit to nonfill defect, the authors examined a pattern pitch and a space width for convex resist line patterns in the line width range of 80-3000 nm with various ratios of space width to line width. Linear analysis of fluorescence intensity using fluorescent microscope images revealed that line pattern pitches with a space width of 0.30 μm could be detected by fluorescent microscopy. The 0.30 μm space width was almost consistent with a value calculated according to a Sparrow resolution limit.

    Original languageEnglish
    Pages (from-to)C6M50-C6M56
    JournalJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
    Volume28
    Issue number6
    DOIs
    Publication statusPublished - 2010 Nov

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Instrumentation
    • Process Chemistry and Technology
    • Surfaces, Coatings and Films
    • Electrical and Electronic Engineering
    • Materials Chemistry

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