Fabrication sub-micron gratings based on embossing

Yigui Li, Chun Hui, Jun Zhu, Jingquan Liu, Y. Kanamori

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrated two kinds of sub-micron gratings fabricated by embossing method from anisotropically etched silicon molds. One kind of grating is a line grating with a pitch of 500 nm; the other kind is grating array with a pitch of 200 nm. We investigated the feasibility of the fabrication method for the micro fabrication of the high aspect ratio silicon molds: that is for fabricating molds by using electron beam lithography plus fast atom beam (FAB) etching. The replication yield, repeatability and efficiency from the original master are good. This technique can also be used to fabricate other sub-micron scale structures.

Original languageEnglish
Title of host publicationDTIP 2003 - Design, Test, Integration and Packaging of MEMS/MOEMS 2003
EditorsBernard Courtois, Jean Michel Karam, Jan Korvink, Karen Markus, Keren Bergman, Bernd Michel
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages350-352
Number of pages3
ISBN (Electronic)078037066X, 9780780370661
DOIs
Publication statusPublished - 2003 Jan 1
Event5th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS 2003, DTIP 2003 - Cannes, France
Duration: 2003 May 52003 May 7

Publication series

NameDTIP 2003 - Design, Test, Integration and Packaging of MEMS/MOEMS 2003

Other

Other5th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS 2003, DTIP 2003
CountryFrance
CityCannes
Period03/5/503/5/7

Keywords

  • Atomic beams
  • Cathodes
  • Electron beams
  • Embossing
  • Etching
  • Fabrication
  • Gratings
  • Microstructure
  • Resists
  • Silicon

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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