Fabrication of visible-light-transparent solar cells using p-type nio films by low oxygen fraction reactive rf sputtering deposition

Moe Warasawa, Yousuke Watanabe, Jun Ishida, Yoshitsuna Murata, Shigefusa F. Chichibu, Mutsumi Sugiyama

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

Visible-light-transparent p-type NiO films were deposited by reactive RF sputtering under unintentional heating. An optical transmittance of >80% was obtained in the wavelength range of 500-800nm when the films were deposited under a very low O2 fraction in the gas phase O2/(Ar + O) = 0.5%. This result may reflect a decrease in the concentration of Ni vacancies due to the increase in their formation energy under oxygen-poor deposition conditions. Heterostructure pn junctions consisting of p-type NiO and n-type ZnO layers were also deposited. We eventually observed a slight but noticeable photovoltaic effect.

Original languageEnglish
Article number021102
JournalJapanese journal of applied physics
Volume52
Issue number2
DOIs
Publication statusPublished - 2013 Feb 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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