Fabrication of transparent SiO 2 glass by pressureless sintering and spark plasma sintering

Jianfeng Zhang, Rong Tu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

29 Citations (Scopus)

Abstract

Transparent SiO 2 bodies were prepared by pressureless sintering (PLS) and spark plasma sintering (SPS). The effects of sintering and annealing temperature on the transmittance of the SiO 2 bodies were investigated. The SiO 2 bodies sintered by SPS and PLS at 1073-1573 K were amorphous. With increasing the sintering temperature to 1673 K, the SiO 2 bodies sintered by PLS were crystallized while those sintered by SPS were still amorphous. The relative density of the SiO 2 bodies sintered by SPS was 98.5% at 1373 K and 100% at 1573 K, whereas that sintered by PLS was 92.6% at 1373 K and 98.9% at 1573 K. The transmittance was 91.0% and 81.5% at a wavelength (λ) of 2 μm for the SiO 2 sintered bodies by SPS and PLS, respectively. In the ultraviolet range, the transmittance of the SiO 2 bodies sintered by SPS at 1573 K was about 40% at λ = 200 nm and increased to 75% after annealing at 1073 K for 1 h, which was about three times of the transmittance of the SiO 2 bodies sintered by PLS (24.8%).

Original languageEnglish
Pages (from-to)2673-2678
Number of pages6
JournalCeramics International
Volume38
Issue number4
DOIs
Publication statusPublished - 2012 May

Keywords

  • Glass
  • Silica
  • Spark plasma sintering
  • Transmittance
  • UV-vis-NIR spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry

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