Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrates

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164 Citations (Scopus)

Abstract

We investigate theoretically and experimentally transmission color filters using silicon subwavelength gratings on quartz substrates. Each grating area is 120 μm-square, which is suitable pixel size for displays and multichannel detectors. In the fabrication, electron beam lithography and fast atom beam etching are used. The grating periods are 400, 350, and 440 nm for the red, green, and blue filters, respectively. The transmission spectrum obtained from a coupling between an incident light and the submicrometer periodic grating matches with human color perception. The transmittances of 71.1%, 58.1%, and 59.3% are obtained for the red, green, and blue filters, respectively.

Original languageEnglish
Pages (from-to)2126-2128
Number of pages3
JournalIEEE Photonics Technology Letters
Volume18
Issue number20
DOIs
Publication statusPublished - 2006 Oct 15

Keywords

  • Micromachining
  • Optical device fabrication
  • Optical filters
  • Optical gratings
  • Periodic structures

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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