Fabrication of TiO2-based transparent conducting oxide on glass and polyimide substrates

T. Hitosugi; N. Yamada; N. L.H. Hoang; J. Kasai; S. Nakao; T. Shimada; T. Hasegawa

doi:10.1016/j.tsf.2008.11.090

Fabrication of TiO₂-based transparent conducting oxide on glass and polyimide substrates

T. Hitosugi, N. Yamada, N. L.H. Hoang, J. Kasai, S. Nakao, T. Shimada, T. Hasegawa

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

We report on preparation and properties of anatase Nb-doped TiO₂ transparent conducting oxide films on glass and polyimide substrates. Amorphous Ti_0.96Nb_0.04O₂ films were deposited at room temperature by using sputtering, and were then crystallized through annealing under reducing atmosphere. Use of a seed layer substantially improved the crystallinity and resistivity (ρ) of the films. We attained ρ = 9.2 × 10^{- 4} Ω cm and transmittance of ~ 70% in the visible region on glass by annealing at 300 °C in vacuum. The minimum ρ of 7.0 × 10^{- 4} Ω cm was obtained by 400 °C annealing in pure H₂.

Original language	English
Pages (from-to)	3106-3109
Number of pages	4
Journal	Thin Solid Films
Volume	517
Issue number	10
DOIs	https://doi.org/10.1016/j.tsf.2008.11.090
Publication status	Published - 2009 Mar 31

Keywords

Sputtering
Titanium dioxide
Titanium oxide
Transparent conducting oxide

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2008.11.090

Cite this

@article{d01c283460a04e6aac4fe02ce18d9a75,

title = "Fabrication of TiO2-based transparent conducting oxide on glass and polyimide substrates",

abstract = "We report on preparation and properties of anatase Nb-doped TiO2 transparent conducting oxide films on glass and polyimide substrates. Amorphous Ti0.96Nb0.04O2 films were deposited at room temperature by using sputtering, and were then crystallized through annealing under reducing atmosphere. Use of a seed layer substantially improved the crystallinity and resistivity (ρ) of the films. We attained ρ = 9.2 × 10- 4 Ω cm and transmittance of ~ 70% in the visible region on glass by annealing at 300 °C in vacuum. The minimum ρ of 7.0 × 10- 4 Ω cm was obtained by 400 °C annealing in pure H2.",

keywords = "Sputtering, Titanium dioxide, Titanium oxide, Transparent conducting oxide",

author = "T. Hitosugi and N. Yamada and Hoang, {N. L.H.} and J. Kasai and S. Nakao and T. Shimada and T. Hasegawa",

note = "Funding Information: This work was supported by the Global COE Program for Chemistry Innovation, NEDO, MEXT Elements Science and Technology Project, and Grain-in-Aid for Young Scientists (B) 19760475, 2007.",

year = "2009",

month = mar,

day = "31",

doi = "10.1016/j.tsf.2008.11.090",

language = "English",

volume = "517",

pages = "3106--3109",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "10",

}

TY - JOUR

T1 - Fabrication of TiO2-based transparent conducting oxide on glass and polyimide substrates

AU - Hitosugi, T.

AU - Yamada, N.

AU - Hoang, N. L.H.

AU - Kasai, J.

AU - Nakao, S.

AU - Shimada, T.

AU - Hasegawa, T.

N1 - Funding Information: This work was supported by the Global COE Program for Chemistry Innovation, NEDO, MEXT Elements Science and Technology Project, and Grain-in-Aid for Young Scientists (B) 19760475, 2007.

PY - 2009/3/31

Y1 - 2009/3/31

N2 - We report on preparation and properties of anatase Nb-doped TiO2 transparent conducting oxide films on glass and polyimide substrates. Amorphous Ti0.96Nb0.04O2 films were deposited at room temperature by using sputtering, and were then crystallized through annealing under reducing atmosphere. Use of a seed layer substantially improved the crystallinity and resistivity (ρ) of the films. We attained ρ = 9.2 × 10- 4 Ω cm and transmittance of ~ 70% in the visible region on glass by annealing at 300 °C in vacuum. The minimum ρ of 7.0 × 10- 4 Ω cm was obtained by 400 °C annealing in pure H2.

AB - We report on preparation and properties of anatase Nb-doped TiO2 transparent conducting oxide films on glass and polyimide substrates. Amorphous Ti0.96Nb0.04O2 films were deposited at room temperature by using sputtering, and were then crystallized through annealing under reducing atmosphere. Use of a seed layer substantially improved the crystallinity and resistivity (ρ) of the films. We attained ρ = 9.2 × 10- 4 Ω cm and transmittance of ~ 70% in the visible region on glass by annealing at 300 °C in vacuum. The minimum ρ of 7.0 × 10- 4 Ω cm was obtained by 400 °C annealing in pure H2.

KW - Sputtering

KW - Titanium dioxide

KW - Titanium oxide

KW - Transparent conducting oxide

UR - http://www.scopus.com/inward/record.url?scp=61449113005&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=61449113005&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2008.11.090

DO - 10.1016/j.tsf.2008.11.090

M3 - Article

AN - SCOPUS:61449113005

VL - 517

SP - 3106

EP - 3109

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 10

ER -