Fabrication of TiO2-based transparent conducting oxide on glass and polyimide substrates

T. Hitosugi, N. Yamada, N. L.H. Hoang, J. Kasai, S. Nakao, T. Shimada, T. Hasegawa

    Research output: Contribution to journalArticlepeer-review

    33 Citations (Scopus)

    Abstract

    We report on preparation and properties of anatase Nb-doped TiO2 transparent conducting oxide films on glass and polyimide substrates. Amorphous Ti0.96Nb0.04O2 films were deposited at room temperature by using sputtering, and were then crystallized through annealing under reducing atmosphere. Use of a seed layer substantially improved the crystallinity and resistivity (ρ) of the films. We attained ρ = 9.2 × 10- 4 Ω cm and transmittance of ~ 70% in the visible region on glass by annealing at 300 °C in vacuum. The minimum ρ of 7.0 × 10- 4 Ω cm was obtained by 400 °C annealing in pure H2.

    Original languageEnglish
    Pages (from-to)3106-3109
    Number of pages4
    JournalThin Solid Films
    Volume517
    Issue number10
    DOIs
    Publication statusPublished - 2009 Mar 31

    Keywords

    • Sputtering
    • Titanium dioxide
    • Titanium oxide
    • Transparent conducting oxide

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

    Fingerprint

    Dive into the research topics of 'Fabrication of TiO<sub>2</sub>-based transparent conducting oxide on glass and polyimide substrates'. Together they form a unique fingerprint.

    Cite this