Fabrication of TiO2-based transparent conducting oxide films on glass by pulsed laser deposition

Taro Hitosugi; Atsuki Ueda; Yutaka Furubayashi; Yasushi Hirose; Seiji Konuma; Toshihiro Shimada; Tetsuya Hasegawa

doi:10.1143/JJAP.46.L86

Fabrication of TiO₂-based transparent conducting oxide films on glass by pulsed laser deposition

Taro Hitosugi, Atsuki Ueda, Yutaka Furubayashi, Yasushi Hirose, Seiji Konuma, Toshihiro Shimada, Tetsuya Hasegawa

Research output: Contribution to journal › Article › peer-review

55 Citations (Scopus)

Abstract

Nb-doped anatase TiO₂ (Ti_0.94Nb_0.06O ₂) films with excellent conductivity and transparency were deposited on non-alkali glass by pulsed laser deposition. X-ray diffraction analysis and transmission electron microscopy confirmed that the obtained films were polycrystalline with anatase structure. The films deposited at a substrate temperature of 250°C with subsequent H₂ annealing at 500°C showed a resistivity of 1.5 × 10^-3 Ω·cm at room temperature and an optical transmittance of 60-80% in the visible region. These results indicate that anatase Ti_0.94Nb_0.06O₂ has great potential as a transparent conducting oxide that could replace Sn-doped In₂O₃ (ITO).

Original language	English
Pages (from-to)	L86-L88
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	46
Issue number	1-3
DOIs	https://doi.org/10.1143/JJAP.46.L86
Publication status	Published - 2007 Jan 12

Keywords

Pulsed laser deposition
Titanium dioxide
Transparent conducting oxide

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy (miscellaneous)
Physics and Astronomy(all)

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10.1143/JJAP.46.L86

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Fabrication of TiO₂-based transparent conducting oxide films on glass by pulsed laser deposition. / Hitosugi, Taro; Ueda, Atsuki; Furubayashi, Yutaka; Hirose, Yasushi; Konuma, Seiji; Shimada, Toshihiro; Hasegawa, Tetsuya.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 46, No. 1-3, 12.01.2007, p. L86-L88.

Research output: Contribution to journal › Article › peer-review

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abstract = "Nb-doped anatase TiO2 (Ti0.94Nb0.06O 2) films with excellent conductivity and transparency were deposited on non-alkali glass by pulsed laser deposition. X-ray diffraction analysis and transmission electron microscopy confirmed that the obtained films were polycrystalline with anatase structure. The films deposited at a substrate temperature of 250°C with subsequent H2 annealing at 500°C showed a resistivity of 1.5 × 10-3 Ω·cm at room temperature and an optical transmittance of 60-80% in the visible region. These results indicate that anatase Ti0.94Nb0.06O2 has great potential as a transparent conducting oxide that could replace Sn-doped In2O3 (ITO).",

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AU - Shimada, Toshihiro

AU - Hasegawa, Tetsuya

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N2 - Nb-doped anatase TiO2 (Ti0.94Nb0.06O 2) films with excellent conductivity and transparency were deposited on non-alkali glass by pulsed laser deposition. X-ray diffraction analysis and transmission electron microscopy confirmed that the obtained films were polycrystalline with anatase structure. The films deposited at a substrate temperature of 250°C with subsequent H2 annealing at 500°C showed a resistivity of 1.5 × 10-3 Ω·cm at room temperature and an optical transmittance of 60-80% in the visible region. These results indicate that anatase Ti0.94Nb0.06O2 has great potential as a transparent conducting oxide that could replace Sn-doped In2O3 (ITO).

AB - Nb-doped anatase TiO2 (Ti0.94Nb0.06O 2) films with excellent conductivity and transparency were deposited on non-alkali glass by pulsed laser deposition. X-ray diffraction analysis and transmission electron microscopy confirmed that the obtained films were polycrystalline with anatase structure. The films deposited at a substrate temperature of 250°C with subsequent H2 annealing at 500°C showed a resistivity of 1.5 × 10-3 Ω·cm at room temperature and an optical transmittance of 60-80% in the visible region. These results indicate that anatase Ti0.94Nb0.06O2 has great potential as a transparent conducting oxide that could replace Sn-doped In2O3 (ITO).

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