Fabrication of spin-frustrated Sm2Mo2O7 epitaxial films: High throughput optimization using a temperature gradient method

J. Nishimura, T. Fukumura, M. Ohtani, Y. Taguchi, M. Kawasaki, I. Ohkubo, H. Koinuma, H. Ohguchi, K. Ono, Oshima, Y. Tokura

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