Fabrication of silicon pillar with 25nm half pitch using new multiple double patterning technique

Masato Kushibiki, Arisa Hara, Eiichi Nishimura, Tetsuo Endoh

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Fingerprint Dive into the research topics of 'Fabrication of silicon pillar with 25nm half pitch using new multiple double patterning technique'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy