Fabrication of SiGe bulk crystals with uniform composition as substrates for Si-based heterostructures

N. Usami, Y. Azuma, T. Ujihara, G. Sazaki, Kozo Fujiwara, Y. Murakami, K. Nakajima

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

SiGe bulk crystal was grown by the multicomponent zone-melting method equipped with an in situ monitoring system of the position and the temperature at the crystal-solution interface. By utilizing the in situ monitoring system, an attempt was made to control the interface position at a fixed position during growth by balancing the growth rate and the pulling rate of the crystal. This led to realization of SiGe bulk crystal with Ge composition of 0.86±0.004 over 22 mm in length. However, as growth proceeds, development of small angle boundaries was evidenced by X-ray characterizations. This polycrystallization was found to be accompanied with appearance of deep-level emission in photoluminescence spectra. A preliminary result to grow SiGe with intermediate composition, which is important for Si-based heterostructures, was also performed.

Original languageEnglish
Pages (from-to)364-367
Number of pages4
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume89
Issue number1-3
DOIs
Publication statusPublished - 2002 Feb 14

Keywords

  • Bulk crystal
  • In situ monitoring
  • Multicomponent zone-melting method
  • SiGe

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Fabrication of SiGe bulk crystals with uniform composition as substrates for Si-based heterostructures'. Together they form a unique fingerprint.

  • Cite this