Fabrication of short-range ordered nanoholes on silicon surfaces by electron irradiation

Yutaka Ohno, Seiji Takeda, Toshinari Ichihashi, Sumio Iijima

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Silicon surface nanoholes, which are small pits introduced spontaneously on the electron exit surfaces of silicon foils by electron irradiation, distribute orderly in a short range. The nearest-neighbor distance and mean opening area of the nanoholes exhibit an Arrhenius-like behavior at high temperatures. The formation mechanism is discussed in terms of the migration of surface vacancies under electron irradiation conditions, and the activation energy of the migration is estimated to be 0.3 ± 0.04 eV.

Original languageEnglish
Pages (from-to)434-439
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number1
DOIs
Publication statusPublished - 2007 Jan 10
Externally publishedYes

Keywords

  • Electron irradiation
  • Migration under electron irradiation
  • Silicon
  • Surface nanoholes
  • Surface vacancies

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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