Fabrication of phase reflection sawtooth gratings optimized by scalar and vector way by using diamond cutting

Cha Bum Lee; T. Kuriyagawa; Tae Jun Kim; Sun Kyu Lee

doi:10.1115/MicroNano2008-70266

Fabrication of phase reflection sawtooth gratings optimized by scalar and vector way by using diamond cutting

Cha Bum Lee, T. Kuriyagawa, Tae Jun Kim, Sun Kyu Lee

MEN - Biomedical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

This paper presents optimization of phase reflection sawtooth gratings with a period of 2.0 μm and a depth of 0.2 μm based on the Fourier transformation (FT) and the rigorous coupled wave analysis (RCWA). And its fabrication on oxygen free Cu and electroless Ni-coated surfaces by using diamond cutting in a shaping process whose toolpath is interfered to provide smaller period. The diffraction efficiencies were estimated 100% for FT, 83.0% and 79.0% for TE and TM polarization of the incident light at a depth of 0.2 μm̃It was found that electroless Ni-coated surface had better performance in terms of machining and optical functionality. From optical testing, the diffraction efficiencies were measured 84.0% and 84.4% for TE and TM polarization, respectively.

Original language	English
Title of host publication	2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008
Pages	685-686
Number of pages	2
DOIs	https://doi.org/10.1115/MicroNano2008-70266
Publication status	Published - 2008 Dec 1
Event	2008 ASME 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008 - Kowloon, Hong Kong Duration: 2008 Jun 3 → 2008 Jun 5

Publication series

Name	2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008

Other

Other	2008 ASME 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008
Country	Hong Kong
City	Kowloon
Period	08/6/3 → 08/6/5

ASJC Scopus subject areas

Biotechnology
Electrical and Electronic Engineering

Access to Document

10.1115/MicroNano2008-70266

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Lee, C. B., Kuriyagawa, T., Kim, T. J., & Lee, S. K. (2008). Fabrication of phase reflection sawtooth gratings optimized by scalar and vector way by using diamond cutting. In 2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008 (pp. 685-686). (2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008). https://doi.org/10.1115/MicroNano2008-70266

Fabrication of phase reflection sawtooth gratings optimized by scalar and vector way by using diamond cutting. / Lee, Cha Bum; Kuriyagawa, T.; Kim, Tae Jun; Lee, Sun Kyu.

2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008. 2008. p. 685-686 (2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Lee, CB, Kuriyagawa, T, Kim, TJ & Lee, SK 2008, Fabrication of phase reflection sawtooth gratings optimized by scalar and vector way by using diamond cutting. in 2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008. 2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008, pp. 685-686, 2008 ASME 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008, Kowloon, Hong Kong, 08/6/3. https://doi.org/10.1115/MicroNano2008-70266

Lee CB, Kuriyagawa T, Kim TJ, Lee SK. Fabrication of phase reflection sawtooth gratings optimized by scalar and vector way by using diamond cutting. In 2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008. 2008. p. 685-686. (2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008). https://doi.org/10.1115/MicroNano2008-70266

Lee, Cha Bum ; Kuriyagawa, T. ; Kim, Tae Jun ; Lee, Sun Kyu. / Fabrication of phase reflection sawtooth gratings optimized by scalar and vector way by using diamond cutting. 2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008. 2008. pp. 685-686 (2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008).

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abstract = "This paper presents optimization of phase reflection sawtooth gratings with a period of 2.0 μm and a depth of 0.2 μm based on the Fourier transformation (FT) and the rigorous coupled wave analysis (RCWA). And its fabrication on oxygen free Cu and electroless Ni-coated surfaces by using diamond cutting in a shaping process whose toolpath is interfered to provide smaller period. The diffraction efficiencies were estimated 100% for FT, 83.0% and 79.0% for TE and TM polarization of the incident light at a depth of 0.2 μ{\~m}It was found that electroless Ni-coated surface had better performance in terms of machining and optical functionality. From optical testing, the diffraction efficiencies were measured 84.0% and 84.4% for TE and TM polarization, respectively.",

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N2 - This paper presents optimization of phase reflection sawtooth gratings with a period of 2.0 μm and a depth of 0.2 μm based on the Fourier transformation (FT) and the rigorous coupled wave analysis (RCWA). And its fabrication on oxygen free Cu and electroless Ni-coated surfaces by using diamond cutting in a shaping process whose toolpath is interfered to provide smaller period. The diffraction efficiencies were estimated 100% for FT, 83.0% and 79.0% for TE and TM polarization of the incident light at a depth of 0.2 μm̃It was found that electroless Ni-coated surface had better performance in terms of machining and optical functionality. From optical testing, the diffraction efficiencies were measured 84.0% and 84.4% for TE and TM polarization, respectively.

AB - This paper presents optimization of phase reflection sawtooth gratings with a period of 2.0 μm and a depth of 0.2 μm based on the Fourier transformation (FT) and the rigorous coupled wave analysis (RCWA). And its fabrication on oxygen free Cu and electroless Ni-coated surfaces by using diamond cutting in a shaping process whose toolpath is interfered to provide smaller period. The diffraction efficiencies were estimated 100% for FT, 83.0% and 79.0% for TE and TM polarization of the incident light at a depth of 0.2 μm̃It was found that electroless Ni-coated surface had better performance in terms of machining and optical functionality. From optical testing, the diffraction efficiencies were measured 84.0% and 84.4% for TE and TM polarization, respectively.

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