TY - GEN
T1 - Fabrication of phase reflection sawtooth gratings optimized by scalar and vector way by using diamond cutting
AU - Lee, Cha Bum
AU - Kuriyagawa, T.
AU - Kim, Tae Jun
AU - Lee, Sun Kyu
PY - 2008/12/1
Y1 - 2008/12/1
N2 - This paper presents optimization of phase reflection sawtooth gratings with a period of 2.0 μm and a depth of 0.2 μm based on the Fourier transformation (FT) and the rigorous coupled wave analysis (RCWA). And its fabrication on oxygen free Cu and electroless Ni-coated surfaces by using diamond cutting in a shaping process whose toolpath is interfered to provide smaller period. The diffraction efficiencies were estimated 100% for FT, 83.0% and 79.0% for TE and TM polarization of the incident light at a depth of 0.2 μm̃It was found that electroless Ni-coated surface had better performance in terms of machining and optical functionality. From optical testing, the diffraction efficiencies were measured 84.0% and 84.4% for TE and TM polarization, respectively.
AB - This paper presents optimization of phase reflection sawtooth gratings with a period of 2.0 μm and a depth of 0.2 μm based on the Fourier transformation (FT) and the rigorous coupled wave analysis (RCWA). And its fabrication on oxygen free Cu and electroless Ni-coated surfaces by using diamond cutting in a shaping process whose toolpath is interfered to provide smaller period. The diffraction efficiencies were estimated 100% for FT, 83.0% and 79.0% for TE and TM polarization of the incident light at a depth of 0.2 μm̃It was found that electroless Ni-coated surface had better performance in terms of machining and optical functionality. From optical testing, the diffraction efficiencies were measured 84.0% and 84.4% for TE and TM polarization, respectively.
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U2 - 10.1115/MicroNano2008-70266
DO - 10.1115/MicroNano2008-70266
M3 - Conference contribution
AN - SCOPUS:69949115996
SN - 0791842940
SN - 9780791842942
T3 - 2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008
SP - 685
EP - 686
BT - 2008 Proceedings of the ASME - 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008
T2 - 2008 ASME 2nd International Conference on Integration and Commercialization of Micro and Nanosystems, MicroNano 2008
Y2 - 3 June 2008 through 5 June 2008
ER -