Fabrication of optically active Er3+-doped Bi2O 3-SiO2 glass thin films by pulsed laser deposition

Shusaku Akiba, Masahiro Takakura, Akifumi Matsuda, Wakana Hara, Takashi Okada, Takahiro Watanabe, Yuki Kondo, Setsuro Ito, Parhat Ahmet, Toyohiro Chikyo, Setsuhisa Tanabe, Teiichi Hanada, Mamoru Yoshimoto

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2 Citations (Scopus)

Abstract

We examined the fabrication conditions of optically active Er 3+-doped Bi2O3-SiO2 glass thin films prepared by pulsed laser deposition using a glass target with a nominal composition (mol %) of 41Bi2O3·57SiO 2·2Er2O3. The transparent glass films were obtained at 200°C under 5 × 10-2Torr O2. The glass films were found to possess a composition and a refractive index close to those of the bulk glass used as the target. The films exhibited a broad emission of Er3+ ions at around 1.5-1.6 μm as well as Er 3+ upconversion-pumped fluorescence in the 500-700 nm range.

Original languageEnglish
Pages (from-to)5933-5935
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number7
DOIs
Publication statusPublished - 2006 Jul 7
Externally publishedYes

Keywords

  • Bismuth oxide
  • Erbium
  • Glass thin film
  • Luminescence
  • Pulsed laser deposition
  • Upconversion fluorescence

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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    Akiba, S., Takakura, M., Matsuda, A., Hara, W., Okada, T., Watanabe, T., Kondo, Y., Ito, S., Ahmet, P., Chikyo, T., Tanabe, S., Hanada, T., & Yoshimoto, M. (2006). Fabrication of optically active Er3+-doped Bi2O 3-SiO2 glass thin films by pulsed laser deposition. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 45(7), 5933-5935. https://doi.org/10.1143/JJAP.45.5933