Fabrication of nanosized structures on Nafion membranes by thermal nanoimprinting

Nobuya Hiroshiba, Wataru Yano, Ryuji Okumura, Yo Ichikawa

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)


    We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm2 square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.

    Original languageEnglish
    Pages (from-to)133-135
    Number of pages3
    JournalIEICE Transactions on Electronics
    Issue number2
    Publication statusPublished - 2015 Feb 1


    • Flexible devices
    • Ion-conductive polymer
    • Nafion
    • Nanoimprinting

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Electrical and Electronic Engineering


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