Fabrication of Nanopit Arrays on Si(111)

Won Chul Moon, Tatsuo Yoshinobu, Hiroshi Iwasaki

Research output: Contribution to journalConference articlepeer-review

13 Citations (Scopus)


The fabrication of nanopit arrays on n-type Si(111) substrates by anodic oxidation with atomic force microscope (AFM) followed by chemical etching is presented. Possible applications for nanopit arrays include controlled nucleation sites in crystal growth and metal embedding for quantum devices. In this study, we investigate the anodic oxidation and chemical etching processes in order to optimize the conditions for the fabrication of dots and pits of the desired shape and size. The dependence of the process on bias voltage, pulse length, and humidity is reported.

Original languageEnglish
Pages (from-to)483-486
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number1 B
Publication statusPublished - 1999
Externally publishedYes
EventProceedings of the 1998 International Symposium on Formation, Physics and Device Application of Quantum Dot Structures, QDS-98 - Sapporo, Japan
Duration: 1998 May 311998 Jun 4


  • AFM
  • Nanofabrication
  • Quantum dot
  • Silicon

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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