Fabrication of nano-gap electrodes using electroplating technique

Yoshiaki Kashimura, Hiroshi Nakashima, Kazuaki Furukawa, Keiichi Torimitsu

Research output: Contribution to journalConference articlepeer-review

65 Citations (Scopus)

Abstract

We report a simple and controllable method for fabricating a pair of electrodes with a sub-10-nm gap, namely nano-gap electrodes, by using a conventional electroplating technique. A pair of initial electrodes with a 100-200 nm gap is fabricated by electron beam lithography, and then gold is deposited electrochemically to reduce this gap. A sub-10-nm gap is produced by halting the electroplating just before the electrodes make contact with each other. We also use our technique to fabricate nano-gap electrodes with a gold and a platinum finger, and with three gold fingers.

Original languageEnglish
Pages (from-to)317-321
Number of pages5
JournalThin Solid Films
Volume438-439
DOIs
Publication statusPublished - 2003 Aug 22
Externally publishedYes
EventThe 5th International Conference on Nano-Molecular Electronics - Kobe, Japan
Duration: 2002 Dec 102002 Dec 12

Keywords

  • Electroplating
  • Molecular electronics
  • Nano-gap electrode

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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