Fabrication of multilayered film of polyimide nanoparticles for low-k applications

Gufan Zhao, Takayuki Ishizaka, Hitoshi Kasai, Hidetoshi Oikawa, Hachiro Nakanishi

    Research output: Contribution to conferencePaperpeer-review

    Abstract

    In order to reduce dielectric constant of polyimide, preparation of porous films assembled by polyimide nanoparticles was investigated. We utilized the electrodeposition of polyimide nanoparticles to prepare porous low-k films possessing voids between particles. The film morphology can be controlled by changing electrical potential and dispersion concentration of polyimide nanoparticles. Dielectric properties of porous films obtained will be discussed. Moreover, fabrication of porous polyimide nanoparticles was also studied.

    Original languageEnglish
    Pages3815-3816
    Number of pages2
    Publication statusPublished - 2006 Dec 1
    Event55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, Japan
    Duration: 2006 Sep 202006 Sep 22

    Other

    Other55th Society of Polymer Science Japan Symposium on Macromolecules
    Country/TerritoryJapan
    CityToyama
    Period06/9/2006/9/22

    Keywords

    • Electrodeposition
    • Low-k
    • Multilayered film
    • Polyimide
    • Porous nanoparticle
    • Reprecipitation

    ASJC Scopus subject areas

    • Engineering(all)

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