Fabrication of micromechanical structures with a new electrodeless electrochemical etch stop

C. M.A. Ashruf, P. J. French, P. M. Sarro, M. Nagao, Masayoshi Esashi

Research output: Contribution to conferencePaperpeer-review

5 Citations (Scopus)

Abstract

A new electrochemical etch stop which does not require external contacts or power source has been studied. This technique yields a simple and effective method to achieve an etch-stop. The passivation voltage is generated internally in a Au/Cr/n-Si/TMAH cell. Test structures have been used to examine the conditions required for the etch stop. Silicon membranes have been fabricated using this etch stop technique to demonstrate the applicability to microsensors.

Original languageEnglish
Pages703-706
Number of pages4
Publication statusPublished - 1997 Jan 1
Externally publishedYes
EventProceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2) - Chicago, IL, USA
Duration: 1997 Jun 161997 Jun 19

Other

OtherProceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2)
CityChicago, IL, USA
Period97/6/1697/6/19

ASJC Scopus subject areas

  • Engineering(all)

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