TY - JOUR
T1 - Fabrication of low resistivity Nb-doped TIO2 transparent conductive polycrystalline films on glass by reactive sputtering
AU - Yamada, Naoomi
AU - Hitosugi, Taro
AU - Hoang, Ngoc Lam Huong
AU - Furubayashi, Yutaka
AU - Hirose, Yasushi
AU - Shimada, Toshihiro
AU - Hasegawa, Tetsuya
PY - 2007/8/6
Y1 - 2007/8/6
N2 - Nb-doped anatase TiO2 (TNO) polycrystalline films with excellent conductivity and transparency were successfully fabricated by reactive sputtering combined with post annealing in H2 gas. The H2 annealing of as-deposited amorphous films caused an abrupt decrease in resistivity (ρ), which was accompanied by crystallization into the anatase structure. A film deposited on an unheated glass substrate with subsequent H2 annealing at 600 C exhibited a resistivity of 9.5 × 10 -4 Ω cm and an average optical transmittance of ∼75% in the visible region. This ρ value is of the same order as that of epitaxial TNO films, which indicates that sputtering is a promising technique for obtaining large-area TNO films.
AB - Nb-doped anatase TiO2 (TNO) polycrystalline films with excellent conductivity and transparency were successfully fabricated by reactive sputtering combined with post annealing in H2 gas. The H2 annealing of as-deposited amorphous films caused an abrupt decrease in resistivity (ρ), which was accompanied by crystallization into the anatase structure. A film deposited on an unheated glass substrate with subsequent H2 annealing at 600 C exhibited a resistivity of 9.5 × 10 -4 Ω cm and an average optical transmittance of ∼75% in the visible region. This ρ value is of the same order as that of epitaxial TNO films, which indicates that sputtering is a promising technique for obtaining large-area TNO films.
KW - Anatase
KW - Nb-doped TiO
KW - Polycrystalline film
KW - Post deposition annealing
KW - Sputtering
KW - TNO
KW - Transparent conductive oxide
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U2 - 10.1143/JJAP.46.5275
DO - 10.1143/JJAP.46.5275
M3 - Article
AN - SCOPUS:34547921284
VL - 46
SP - 5275
EP - 5277
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 8 A
ER -