Fabrication of low resistivity Nb-doped TIO2 transparent conductive polycrystalline films on glass by reactive sputtering

Naoomi Yamada; Taro Hitosugi; Ngoc Lam Huong Hoang; Yutaka Furubayashi; Yasushi Hirose; Toshihiro Shimada; Tetsuya Hasegawa

doi:10.1143/JJAP.46.5275

Fabrication of low resistivity Nb-doped TIO₂ transparent conductive polycrystalline films on glass by reactive sputtering

Naoomi Yamada, Taro Hitosugi, Ngoc Lam Huong Hoang, Yutaka Furubayashi, Yasushi Hirose, Toshihiro Shimada, Tetsuya Hasegawa

Research output: Contribution to journal › Article › peer-review

80 Citations (Scopus)

Abstract

Nb-doped anatase TiO₂ (TNO) polycrystalline films with excellent conductivity and transparency were successfully fabricated by reactive sputtering combined with post annealing in H₂ gas. The H₂ annealing of as-deposited amorphous films caused an abrupt decrease in resistivity (ρ), which was accompanied by crystallization into the anatase structure. A film deposited on an unheated glass substrate with subsequent H₂ annealing at 600 C exhibited a resistivity of 9.5 × 10 ^-4 Ω cm and an average optical transmittance of ∼75% in the visible region. This ρ value is of the same order as that of epitaxial TNO films, which indicates that sputtering is a promising technique for obtaining large-area TNO films.

Original language	English
Pages (from-to)	5275-5277
Number of pages	3
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	46
Issue number	8 A
DOIs	https://doi.org/10.1143/JJAP.46.5275
Publication status	Published - 2007 Aug 6

Keywords

Anatase
Nb-doped TiO
Polycrystalline film
Post deposition annealing
Sputtering
TNO
Transparent conductive oxide

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1143/JJAP.46.5275

Cite this

Yamada, N., Hitosugi, T., Hoang, N. L. H., Furubayashi, Y., Hirose, Y., Shimada, T., & Hasegawa, T. (2007). Fabrication of low resistivity Nb-doped TIO₂ transparent conductive polycrystalline films on glass by reactive sputtering. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 46(8 A), 5275-5277. https://doi.org/10.1143/JJAP.46.5275

Fabrication of low resistivity Nb-doped TIO₂ transparent conductive polycrystalline films on glass by reactive sputtering. / Yamada, Naoomi; Hitosugi, Taro; Hoang, Ngoc Lam Huong; Furubayashi, Yutaka; Hirose, Yasushi; Shimada, Toshihiro; Hasegawa, Tetsuya.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 46, No. 8 A, 06.08.2007, p. 5275-5277.

Research output: Contribution to journal › Article › peer-review

Yamada, N, Hitosugi, T, Hoang, NLH, Furubayashi, Y, Hirose, Y, Shimada, T & Hasegawa, T 2007, 'Fabrication of low resistivity Nb-doped TIO₂ transparent conductive polycrystalline films on glass by reactive sputtering', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 46, no. 8 A, pp. 5275-5277. https://doi.org/10.1143/JJAP.46.5275

Yamada, Naoomi ; Hitosugi, Taro ; Hoang, Ngoc Lam Huong ; Furubayashi, Yutaka ; Hirose, Yasushi ; Shimada, Toshihiro ; Hasegawa, Tetsuya. / Fabrication of low resistivity Nb-doped TIO₂ transparent conductive polycrystalline films on glass by reactive sputtering. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2007 ; Vol. 46, No. 8 A. pp. 5275-5277.

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title = "Fabrication of low resistivity Nb-doped TIO2 transparent conductive polycrystalline films on glass by reactive sputtering",

abstract = "Nb-doped anatase TiO2 (TNO) polycrystalline films with excellent conductivity and transparency were successfully fabricated by reactive sputtering combined with post annealing in H2 gas. The H2 annealing of as-deposited amorphous films caused an abrupt decrease in resistivity (ρ), which was accompanied by crystallization into the anatase structure. A film deposited on an unheated glass substrate with subsequent H2 annealing at 600 C exhibited a resistivity of 9.5 × 10 -4 Ω cm and an average optical transmittance of ∼75% in the visible region. This ρ value is of the same order as that of epitaxial TNO films, which indicates that sputtering is a promising technique for obtaining large-area TNO films.",

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author = "Naoomi Yamada and Taro Hitosugi and Hoang, {Ngoc Lam Huong} and Yutaka Furubayashi and Yasushi Hirose and Toshihiro Shimada and Tetsuya Hasegawa",

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AB - Nb-doped anatase TiO2 (TNO) polycrystalline films with excellent conductivity and transparency were successfully fabricated by reactive sputtering combined with post annealing in H2 gas. The H2 annealing of as-deposited amorphous films caused an abrupt decrease in resistivity (ρ), which was accompanied by crystallization into the anatase structure. A film deposited on an unheated glass substrate with subsequent H2 annealing at 600 C exhibited a resistivity of 9.5 × 10 -4 Ω cm and an average optical transmittance of ∼75% in the visible region. This ρ value is of the same order as that of epitaxial TNO films, which indicates that sputtering is a promising technique for obtaining large-area TNO films.

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