Fabrication of low resistivity Nb-doped TIO2 transparent conductive polycrystalline films on glass by reactive sputtering

Naoomi Yamada, Taro Hitosugi, Ngoc Lam Huong Hoang, Yutaka Furubayashi, Yasushi Hirose, Toshihiro Shimada, Tetsuya Hasegawa

    Research output: Contribution to journalArticlepeer-review

    80 Citations (Scopus)

    Abstract

    Nb-doped anatase TiO2 (TNO) polycrystalline films with excellent conductivity and transparency were successfully fabricated by reactive sputtering combined with post annealing in H2 gas. The H2 annealing of as-deposited amorphous films caused an abrupt decrease in resistivity (ρ), which was accompanied by crystallization into the anatase structure. A film deposited on an unheated glass substrate with subsequent H2 annealing at 600 C exhibited a resistivity of 9.5 × 10 -4 Ω cm and an average optical transmittance of ∼75% in the visible region. This ρ value is of the same order as that of epitaxial TNO films, which indicates that sputtering is a promising technique for obtaining large-area TNO films.

    Original languageEnglish
    Pages (from-to)5275-5277
    Number of pages3
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Volume46
    Issue number8 A
    DOIs
    Publication statusPublished - 2007 Aug 6

    Keywords

    • Anatase
    • Nb-doped TiO
    • Polycrystalline film
    • Post deposition annealing
    • Sputtering
    • TNO
    • Transparent conductive oxide

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

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