Fabrication of L10-FePt thin films by rapid thermal annealing

K. Aimuta, K. Nishimura, S. Hashi, M. Inoue

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

Fabrication of L10-FePt thin films by using conventional thermal annealing and indirect rapid thermal annealing is studied. By using conventional thermal annealing, L10-FePt thin films are fabricated over 500°C. By using the rapid thermal annealing, it was found that the formation temperature of L10-FePt thin films decreases effectively. In addition, this method enables to prevent the grain growth due to annealing.

Original languageEnglish
Pages (from-to)3898-3900
Number of pages3
JournalIEEE Transactions on Magnetics
Volume41
Issue number10
DOIs
Publication statusPublished - 2005 Oct 1
Externally publishedYes

Keywords

  • Average grain diameter
  • Film surface morphology
  • L1-FePt alloy
  • Rapid thermal annealing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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