TY - JOUR
T1 - Fabrication of L10-FeNi phase by sputtering with rapid thermal annealing
AU - Tashiro, Takayuki
AU - Mizuguchi, Masaki
AU - Kojima, Takayuki
AU - Koganezawa, Tomoyuki
AU - Kotsugi, Masato
AU - Ohtsuki, Takumi
AU - Sato, Kazuhisa
AU - Konno, Toyohiko
AU - Takanashi, Koki
PY - 2018/6/25
Y1 - 2018/6/25
N2 - FeNi films were directly deposited on MgO(001) substrates by co-sputtering and rapid thermal annealing (RTA). The formation of the L10 phase was investigated for films with different thicknesses and different annealing conditions by grazing incidence X-ray diffraction. For the FeNi films with a thickness of 5 nm, superlattice 001 and 110 peaks were observed after annealing at a heating rate of 50 °C/s, which indicates that three variants of L10 grains were formed in the films. The maximum long-range order parameter, which corresponded to a volume-averaged parameter, was approximately 0.11. For the FeNi films with a thickness of 30 nm, a superlattice 110 peak was only observed after annealing at a heating rate of 50 °C/s, and the formation of 001 textured grains was clarified. Magnetic properties also changed depending on the FeNi film structures. The formation mechanism of L10-FeNi is discussed based on the strain caused by RTA in the FeNi films.
AB - FeNi films were directly deposited on MgO(001) substrates by co-sputtering and rapid thermal annealing (RTA). The formation of the L10 phase was investigated for films with different thicknesses and different annealing conditions by grazing incidence X-ray diffraction. For the FeNi films with a thickness of 5 nm, superlattice 001 and 110 peaks were observed after annealing at a heating rate of 50 °C/s, which indicates that three variants of L10 grains were formed in the films. The maximum long-range order parameter, which corresponded to a volume-averaged parameter, was approximately 0.11. For the FeNi films with a thickness of 30 nm, a superlattice 110 peak was only observed after annealing at a heating rate of 50 °C/s, and the formation of 001 textured grains was clarified. Magnetic properties also changed depending on the FeNi film structures. The formation mechanism of L10-FeNi is discussed based on the strain caused by RTA in the FeNi films.
KW - L1-FeNi
KW - Magnetic anisotropy
KW - Magnetic materials
KW - Ordered alloys
KW - Sputtering
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U2 - 10.1016/j.jallcom.2018.02.318
DO - 10.1016/j.jallcom.2018.02.318
M3 - Article
AN - SCOPUS:85044942546
VL - 750
SP - 164
EP - 170
JO - Journal of Alloys and Compounds
JF - Journal of Alloys and Compounds
SN - 0925-8388
ER -