Fabrication of isolated FePd nanoparticles by sputtering and heat treatment

Tetsu Ichitsubo, Masayuki Koujina, Masao Kawashima, Masahiko Hirao

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

In this paper, we describe the fabrication of two-dimensionally dispersed nanoparticles by sputtering and annealing. FePd has been chosen as the target material. As the first step of this process, ultrathin films were sputter-deposited on Si substrates. Subsequently, they were annealed at 450-800°C. As the result, numerous nanoparticles with a diameter of about 5 nm were formed on the substrate surface, when the thickness of the as-deposited film was approximately less than 3 nm.

Original languageEnglish
Pages (from-to)2858-2859
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number5 A
Publication statusPublished - 2003 May 1
Externally publishedYes

Keywords

  • FePd
  • Isolated nanoparticle
  • Magnetic recording media
  • Nanometer size
  • Sputtering method

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Fabrication of isolated FePd nanoparticles by sputtering and heat treatment'. Together they form a unique fingerprint.

Cite this