Abstract
In this paper, we describe the fabrication of two-dimensionally dispersed nanoparticles by sputtering and annealing. FePd has been chosen as the target material. As the first step of this process, ultrathin films were sputter-deposited on Si substrates. Subsequently, they were annealed at 450-800°C. As the result, numerous nanoparticles with a diameter of about 5 nm were formed on the substrate surface, when the thickness of the as-deposited film was approximately less than 3 nm.
| Original language | English |
|---|---|
| Pages (from-to) | 2858-2859 |
| Number of pages | 2 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 42 |
| Issue number | 5 A |
| Publication status | Published - 2003 May 1 |
| Externally published | Yes |
Keywords
- FePd
- Isolated nanoparticle
- Magnetic recording media
- Nanometer size
- Sputtering method
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)