Fabrication of HTSC single crystalline thin films by tri-phase epitaxy

Ryota Takahashi, Yun Kyung Sung, Yuji Matsumoto, M. Kawasaki, Toyohiro Chikyow, Hideomi Koinuma

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

A high-Tc superconducting (HTSC) thin film with single crystal quality and atomically flat surface is a basic requirement for the fabrication of HTSC electronic devices. Despite extensive effort since the discovery of high-Tc superconductivity, this requirement has not been fully satisfied yet. Based on our experience on HTSC thin film growth, we proposed a novel fabricating method of single crystal RBa2Cu3O7-δ(R=Y, Nd) thin films that are free from grain boundaries and have atomic scale surface smoothness. This method was devised in view of the thermodynamic phase diagram of RBa2Cu3O7-δ) and the characteristics of vapor phase epitaxy (VPE). Since gas, liquid and solid phases are involved in this film growth, it is denoted Tri-Phase Epitaxy (TPE). Giant single crystal grains, verified by X-ray diffraction and transmission electron microscopy (TEM), should provide a big advantage for the use of these films in such applications as high frequency transmission lines and superconducting tunnel junctions.

Original languageEnglish
Pages (from-to)284-288
Number of pages5
JournalNippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Volume66
Issue number4
DOIs
Publication statusPublished - 2002 Apr

Keywords

  • NdBa CuO
  • Pulsed laser deposition
  • Tri-phase epitaxy
  • YBaCuO

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys
  • Materials Chemistry

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