Fabrication of highly conductive Ti1-x Nbx O2 polycrystalline films on glass substrates via crystallization of amorphous phase grown by pulsed laser deposition

T. Hitosugi, A. Ueda, S. Nakao, N. Yamada, Y. Furubayashi, Y. Hirose, T. Shimada, T. Hasegawa

    Research output: Contribution to journalArticle

    133 Citations (Scopus)

    Abstract

    Nb-doped anatase Ti O2 [Ti0.94 Nb0.06 O2 (TNO)] films with high electrical conductivity and transparency were fabricated on nonalkali glass using pulsed laser deposition and subsequent annealing in a H2 atmosphere. The amorphous films as deposited on unheated substrates were found to crystallize, forming polycrystalline films at around 350 °C. The films annealed at 500 °C showed resistivity down to 4.6× 10-4 cm at room temperature and optical transmittance of 60%-80% in the visible region, which are comparable to those of epitaxial films. These results indicate that TNO films have the potential to be practical transparent conducting oxides that could replace indium tin oxide.

    Original languageEnglish
    Article number212106
    JournalApplied Physics Letters
    Volume90
    Issue number21
    DOIs
    Publication statusPublished - 2007 Jun 1

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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