Fabrication of high-resolution periodical structure in photoresist polymers using laser interference technique

Shinya Shibata, Yanlong Che, Okihiro Sugihara, Naomichi Okamoto, Toshikuni Kaino

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Periodical structures in the nanometer order, which are clearer and of superior aspect than those reported elsewhere, were fabricated. These structures were fabricated onto a positive-type photoresist film by a two-beam interference technique using a single-pulse Nd:YAG (355 nm) laser. A grating structure with a depth of more than 300 nm and period of 400 nm was formed, accompanied by wet development. Moreover, a 200-nm-period grating, which is close to the theoretical limit, was successfully fabricated with higher aspect.

Original languageEnglish
Pages (from-to)2370-2371
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number4 B
DOIs
Publication statusPublished - 2004 Apr

Keywords

  • Nanometer grating
  • Photoresist
  • Two-beam interference

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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