Fabrication of high resolution gratings for polymeric optical waveguide devices

Shinya Shibata, Okihiro Sugihara, Toshikuni Kaino, Naomichi Okamoto

Research output: Contribution to journalConference articlepeer-review

2 Citations (Scopus)

Abstract

High resolution gratings for the application of optical waveguide devices are fabricated using a series of photopolymers. The relief gratings were formed by the two-beam interference ablation technique using a third-harmonic generation of a Nd:YAG laser (355nm) onto polyimide and electrooptic polymer films. In polyimide films, the gratings with a period of 400nm and a depth of about 280nm were fabricated by the single-pulse irradiation. We tried to fabricate the gratings using a photoresist accompanied with wet development using an Ar+ laser (488nm). By wet development process, higher aspect and clearer periodical structure at a depth of 320nm and a period of nearly 500nm was realized. High diffraction efficiency of 55.4% was measured from the relief grating. We also replicated the grating to UV curable epoxy resin as an embossing master for the fabrication of waveguide devices.

Original languageEnglish
Pages (from-to)127-133
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5351
DOIs
Publication statusPublished - 2004 Aug 16
EventOrganic Photonic Materials and Devices VI - San Jose, CA, United States
Duration: 2004 Jan 272004 Jan 29

Keywords

  • Grating replication
  • High resolution gratings
  • Photosensitive polymer

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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