Fabrication of high-quality diffractive-lens mold having submicron patterns

Do Kyun Woo, Kazuhiro Hane, Sun Kyu Lee

Research output: Contribution to journalArticlepeer-review

Abstract

In this paper, we present the fabrication of a high-quality diffractive-lens mold having submicron patterns, which is suitable for an ultra-slim optical system. In order to fabricate high-quality diffractive lens with a variety of submicron patterns, the multi-alignment method was used; high-resolution electron-beam lithography and FAB plasma etching were carried out to obtain the patterns. The most important key technology in the multi-alignment method is to reduce alignment error, lithography error, and etching error. In this paper, these major fabrication errors were minimized, and a high-quality diffractive lens with a diameter of 267 μrn (NA = 0.25), minimum pattern width of 226 nm, and thickness of 819 nm was successfully fabricated.

Original languageEnglish
Pages (from-to)1637-1642
Number of pages6
JournalTransactions of the Korean Society of Mechanical Engineers, A
Volume34
Issue number11
DOIs
Publication statusPublished - 2010 Nov 1

Keywords

  • Diffractive lens
  • Electron-Beam lithography
  • FAB(fast atom beam) plasma etching
  • Multi-Alignment method

ASJC Scopus subject areas

  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Fabrication of high-quality diffractive-lens mold having submicron patterns'. Together they form a unique fingerprint.

Cite this